Ort:  Dresden
Datum:  06.09.2022

Master thesis: Characterization of Plasma Parameters in Reactive Ion Etching processes

Die Fraunhofer-Gesellschaft (www.fraunhofer.de) betreibt in Deutschland derzeit 76 Institute und Forschungseinrichtungen und ist die weltweit führende Organisation für anwendungsorientierte Forschung. Rund 30 000 Mitarbeitende erarbeiten das jährliche Forschungsvolumen von 2,9 Milliarden Euro.  

At the Fraunhofer Institute for Photonic Microsystems IPMS, we are working at the top international level onnanoelectronic, mechanical and optical components and their integration into tiny, "smart" devices andsystems. 

Starting from Oct 1st, 2022 an exciting topic for a master thesis in the field of Reactive Ion Etching is available. This plasma based process technology plays a major role in the semiconductor manufacturing since it creates billions of devices with nanometer precision in one step. The continuous development of these technologies in cooperation with industry partners is carried out in the business unit Center Nanoelectronic Technologies (CNT) at Fraunhofer IPMS in Dresden. The CNT conducts research on 300 mm wafers for microchip manufacturers, suppliers, equipment manufacturers and R&D partners in clean room and laboratory facilities. The CNT offers process and technology development as well as services on ultra large scale integration (ULSI) level in the FEoL and BEoL area of various CMOS technology nodes.


What you will do 

  • Setup and execution of process window investigations on innovative industrial plasma etching equipment in a project with partners from semiconductor industry
  • Application of equipment for plasma analytics: mass spectroscopy (QMS), optical emission spectroscopy (OES), electron spectroscopy (SEERS)
  • Optimization of measuring systems for plasma analytics
  • Evaluation and interpretation of measured data in terms of optimization of plasma etching processes
  • Characterization of etched wafers using ellipsometry, AFM and SEM


What you bring to the table 

  • Currently: Master program in physics, applied sciences, process engineering, chemistry or related studies
  • First experience in the area of vacuum and plasma technologies, semiconductor manufacturing processes, preferably Reactive Ion Etching, and plasma analytic systems 
  • Ability to work with vacuum systems and to handle and evaluate large amounts of measurement data (in Excel, Origin or Matlab)
  • Commitment, reliability as well as enthusiasm for working in a team and for experimenting 
  • Fluent English, ideally also German
  • At best you have already some experience of working in the lab or clean room


What you can expect 

We offer you an exciting topic and individual support in the preparation of your thesis by experienced employees. A motivated and dynamic team awaits you in a very well equipped, research and development environment, which is very close to the semiconductor fab facility. In addition, we offer you connecting points within the framework of your studies or your career entry, e.g. a following PhD, the beginning of your scientific career as a junior scientist at Fraunhofer IPMS or becoming an engineer. We support you in this process! 

We value and promote the diversity of our employees' skills and therefore welcome all applications - regardless of age, gender, nationality, ethnic and social origin, religion, ideology, disability, sexual orientation and identity. Severely disabled persons are given preference in the event of equal suitability. 

The weekly working time is to be agreed individually. The scientific work will be carried out in the business unit Nanosystem Technology (NST) at Fraunhofer IPMS in Dresden. The examination takes place via affiliationwith a German university of applied sciences and is governed by the respective state university law. Theposition is limited for the time of the scientific work. 
With its focus on developing key technologies that are vital for the future and enabling the commercial utilization of this work by business and industry, Fraunhofer plays a central role in the innovation process. As a pioneer and catalyst for groundbreaking developments and scientific excellence, Fraunhofer helps shape society now and in the future. 


Have we aroused your interest? Then apply online now with your meaningful application documents. We look forward to getting to know you!  


Human Resources Department I Mrs. Isabell Zwinscher I Phone: +49 (0)351 8823 1227
Specialty Department I Mrs. Dr. Varvara Brackmann I Phone: +49 (0)351 2607 3015 

Fraunhofer-Institut für Photonische Mikrosysteme IPMS 


Requisitions Number: 48103                

Jobsegment: Plasma, Research Scientist, Facilities, R&D Engineer, Science, Operations, Bilingual, Engineering