MA Direct nanostructuring of photoresists with deep ultraviolet (DUV) laser radiation

The Fraunhofer-Gesellschaft (www.fraunhofer.com) currently operates 76 institutes and research institutions throughout Germany and is the world’s leading applied research organization. Around 30 800 employees work with an annual research budget of 3.0 billion euros.

The Fraunhofer Institute for Laser Technology ILT, Europe's leading center for contract research and development in the field of laser technology, in cooperation with the Chair of Laser Technology at RWTH LLT, offers the opportunity to write a diploma thesis.

The In-Volume Structuring and Lithography group deals with the structuring of transparent materials and semiconductors using pulsed laser radiation with pulse durations in the femtosecond to nanosecond range. By using laser wavelengths in the deep ultraviolet range (150-300 nm), structure sizes in the range of a few hundred nanometres can be produced, which are used in the semiconductor industry, medical technology or the optics industry, for example. One of the current challenges arises from the increased demands of the new applications on the resolution and edge quality of the structures produced.

The highest resolution in structuring is currently achieved with indirect photolithographic processes, in which a photoactive layer is first exposed and then chemically developed. However, if it were possible to directly ablate such layers with comparable quality and resolution, this would make the entire microchip production process significantly more energy-efficient and environmentally friendly. This goal could be realised by using lasers with short wavelengths and a new, high-resolution phase mask technology.

What you will do

Independent planning and execution of experiments for basic research and process optimization
Analysing and presenting the results
Support in planning, setting up and carrying out experiments
Carrying out experiments

What you bring to the table

You are studying physics, mechanical engineering, electrical engineering, information technology, materials science or a comparable degree programme
Interest in lasers, nanotechnology, the production of complex components and the development of new processes or the understanding and improvement of existing processes
Previous knowledge of laser and semiconductor technology is an advantage, but not essential

What you can expect

Practice-orientated MA-thesis in an innovative working environment
A creative, diverse, multidisciplinary team with in-depth knowledge
Tasks with responsibility and room for manoeuvre
Close co-operation between science and industry
First-class equipment in the laboratories and offices
Good transport links (bus connections, free multi-storey car park)
Flexible working hours for a better work-life balance

The position is limited to the end of the thesis.

We value and promote the diversity of our employees' skills and therefore welcome all applications - regardless of age, gender, nationality, ethnic and social origin, religion, ideology, disability, sexual orientation and identity. Severely disabled persons are given preference in the event of equal suitability.

With its focus on developing key technologies that are vital for the future and enabling the commercial utilization of this work by business and industry, Fraunhofer plays a central role in the innovation process. As a pioneer and catalyst for groundbreaking developments and scientific excellence, Fraunhofer helps shape society now and in the future.

Interested? Apply online now. We look forward to getting to know you!

Questions about this position will be answered by

Dr. rer. nat. Serhiy Danylyuk

Telefon +49 0241/8906-525

Fraunhofer Institute for Laser Technology ILT

www.ilt.fraunhofer.de

Requisition Number: 73378 Application Deadline: 06/30/2024

Job Segment: R&D Engineer, Electrical Engineering, Materials Science, Nanotechnology, Semiconductor, Engineering, Science

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